Semiconductor device having fin transistor and planar transistor and associated methods of manufacture

ABSTRACT

Disclosed is a fin transistor and a planar transistor and a method of forming the same. The fin transistor and the planar transistor are formed to have gate electrodes with similar thicknesses by selectively recessing a semiconductor substrate in a planar region where the planar transistor is formed.

CROSS-REFERENCE TO RELATED APPLICATION

This is a divisional of application Ser. No. 11/244,136 filed on Oct. 6, 2005, which is incorporated herein by reference in its entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates generally to a semiconductor memory device and a method of manufacturing the same. More particularly, the invention relates to a semiconductor memory device having a fin transistor and a planar transistor and a method of manufacturing the same.

A claim of priority is made to Korean Patent Application No. 10-2004-0083691 filed on Oct. 19, 2004, the disclosure of which is hereby incorporated by reference in its entirety.

2. Description of the Related Art

Field effect transistors (FETs) are perhaps the most common elements found in modern semiconductor integrated circuits (ICs). Within contemporary semiconductor ICs, FETs are characterized by decreasing size and, therefore, increasing fabrication density. This trend is important because significant performance gains in semiconductor ICs may be obtained by producing smaller, more densely packed (i.e., more highly integrated) FETs.

Unfortunately, the fabrication of smaller, more densely packed FETs can lead to a variety of operational and structural problems. For example, scaling down the size of a FET can lead to a phenomenon called “punch through”, whereby source and drain depletion regions fuse together to form a single depletion region, thereby causing drain current to become highly dependent on a drain-source voltage.

Fin FET transistors have been introduced to address the punch through problem, among other problems. A fin FET transistor (hereafter, “fin transistor”) includes a silicon fin structure formed on a semiconductor substrate and a gate electrode formed across the fin structure. The gate electrode is formed in contact with an upper surface and sidewalls of the fin structure. A channel region under the gate electrode is defined by the upper surface and sidewalls of the fin structure. As such, the fin structure effectively creates a wide channel within a limited space, thus allowing a significant amount of current to flow through the channel when the transistor is turned on. In addition, since the gate electrode controls the channel region through the upper surface and sidewalls thereof, the gate is able to more effectively control the channel region to prevent undesirable effects such as punch-through. Because of the above-described characteristics, the fin transistor can be applied to various semiconductor devices.

Semiconductor devices may include fin transistors together with planar FETs (hereafter, planar transistors). A planar transistor is a conventional transistor with a planar channel region. In certain semiconductor devices, in particular, dynamic random access memory (DRAM) devices, the fin transistor may be formed in a cell region, and the planar transistor may be formed in a peripheral circuit region next to the cell region.

FIGS. 1 through 3 are perspective views illustrating a method of forming a semiconductor device having a conventional fin transistor and a planar transistor. In FIGS. 1 through 3, reference symbol “a” indicates a fin region where a fin transistor is formed, and reference symbol “b” indicates a planar region where a planar transistor is formed.

Referring to FIG. 1, first and second hard mask patterns 3 a and 3 b are formed on a semiconductor substrate 1 in respective regions “a” and “b”. Semiconductor substrate 1 is anisotropically etched using first and second hard mask patterns 3 a and 3 b as an etch mask to form a fin active region 5 a in fin region “a” and a planar active region 5 b in planar region “b”. Planar active region 5 b is formed to be wider than fin active region 5 a, and upper surfaces of fin and planar active regions 5 a and 5 b have roughly the same height.

Fin active region 5 a and planar active region 5 b are bounded by respective first and second trenches formed by the anisotropic etching. After fin and planar active regions 5 a and 5 b are formed, a silicon oxide layer 7 filling the first and second trenches is formed on a whole surface of semiconductor substrate 1.

Referring to FIG. 2, a preliminary fin device isolation layer 7 a and a planar device isolation layer 7 b are formed in respective fin and planar regions “a” and “b” by planarizing silicon oxide layer 7 until hard mask patterns 3 a and 3 b are exposed. A photo sensitive pattern (not shown) covering planar region “b” is then formed. The preliminary fin device isolation layer is etched to form a fin device isolation layer 7 a covering lower sidewalls of fin active region 5 a. Thus, upper sidewalls of fin active region 5 a are left exposed. Fin device isolation layer 7 a has a relatively low height compared with planar device isolation layer 7 b. Hard mask patterns 3 a and 3 b are selectively removed to expose upper surfaces of fin and planar active regions 5 a and 5 b.

A thermal oxidation process is performed on semiconductor substrate 1 to form a sidewall gate oxide layer 9 a on exposed areas of fin active region 5 a and a planar gate oxide layer 9 b on exposed areas of planar active region 5 b. A gate conductive layer 11 is then formed over an entire surface of the semiconductor substrate 1.

Referring to FIG. 3, gate conductive layer 11 is patterned to form a fin gate electrode 11 a crossing fin active region 5 a and a planar gate electrode 11 b crossing planar active region 5 b. Fin gate electrode 11 a is formed in contact with an upper surface and both sidewalls of fin active region 5 a, and planar gate electrode 11 b is in contact with an upper surface of planar active region 5 b.

In the above-described method, gate conductive layer 11 is formed with different thicknesses on fin and planar regions “a” and “b” owing to the difference in the heights of respective fin and planar device isolation layers 7 a and 7 b. Accordingly, gate electrodes 11 a and 11 b have different heights and therefore a greater portion of gate conductive layer 11 has to be etched to form gate electrode 11 a than to form gate electrode 11 b.

Because a greater portion of gate conductive layer 11 must be etched to form gate electrode 11 a, planar gate oxide layer 9 b and planar active region 5 b on both sides of planar gate electrode 11 b may be excessively etched while gate electrode 11 a is being formed. As a result, planar gate oxide layer 9 b and planar active region 5 b may be damaged. This damage often results in defects to the electrical characteristics of the fin transistor. For example, leakage current may flow through source/drain regions (not shown) at both sides of planar gate electrode 11 b, and a contact resistance therebetween may be increased.

SUMMARY OF THE INVENTION

According to one embodiment of the present invention, a semiconductor device is provided. The semiconductor device comprises a semiconductor substrate defining a fin region and a planar region, a fin active region formed on the semiconductor substrate in the fin region and protruding upward from the semiconductor substrate, and a planar active region formed on the semiconductor substrate in the planar region and protruding upward from the semiconductor substrate, wherein the planar active region has an upper surface which is lower than an upper surface of the fin active region. The semiconductor device further comprises a fin device isolation layer covering lower sidewalls of the fin active region, a planar device isolation layer completely covering sidewalls of the planar active region, a fin gate electrode formed across the fin active region, and a planar gate electrode formed across the planar active region.

According to another embodiment of the invention, a method of forming a semiconductor device is provided. The method comprises forming a fin active region on a semiconductor substrate defining a fin region and a planar region, the fin active region protruding upward from the semiconductor substrate in the fin region, and forming a planar active region on the semiconductor substrate, the planar active region protruding upward from the semiconductor substrate in the planar region and having an upper surface lower than an upper surface of the fin active region. The method further comprises forming a fin device isolation layer covering lower sidewalls of the fin active region, forming a planar device isolation layer completely covering sidewalls of the planar active region, forming a fin gate electrode across the fin active region, and forming a planar gate electrode across the planar active region.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention is described below in relation to several embodiments illustrated in the accompanying drawings. Throughout the drawings like reference numbers indicate like exemplary elements, components, or steps. In addition, the thickness of layers is exaggerated for clarity. In the drawings:

FIGS. 1 to 3 are perspective views illustrating a method of forming a semiconductor device having conventional fin and planar transistors;

FIG. 4 is a perspective view of a semiconductor device having fin and planar transistors according to an embodiment of the present invention;

FIG. 5 is a cross-sectional view taken along a line between I and I′ in FIG. 4; and,

FIGS. 6 to 14 are perspective views illustrating a method of forming a semiconductor device having fin and planar transistors according to an embodiment of the present invention.

DESCRIPTION OF EXEMPLARY EMBODIMENTS

Exemplary embodiments of the invention are described below with reference to the corresponding drawings. These embodiments are presented as teaching examples. The actual scope of the invention is defined by the claims that follow.

In this written description, the terms “on” and “onto” are used to describe relative positions of layers in a semiconductor device. In order for a layer to be “on” or “onto” another layer according to this description, the layer does not have to be directly on top of the other layer; i.e., intervening layers could be present between the two.

FIG. 4 is a perspective view of a semiconductor device having fin and planar transistors according to an embodiment of the present invention. FIG. 5 is a cross-sectional view taken along a line between I and I′ in FIG. 4. In FIGS. 4 and 5, reference numeral 50 denotes a fin region where a fin transistor is formed and reference numeral 55 indicates a planar region where a planar transistor is formed.

Referring to FIGS. 4 and 5, the semiconductor device comprises a semiconductor substrate 100 formed in fin region 50 and planar region 55. A fin active region 106 a is formed on substrate 100 in fin region 50 and a planar active region 106 b is formed on semiconductor substrate 100 in planar region 55. Both fin active region 106 a and planar active region 106 b protrude upwards from substrate 100, but an upper surface of planar active region 106 b is formed to be lower than an upper surface of fin active region 106 a.

A fin device isolation layer 115 a covering lower sidewalls of fin active region 106 a is formed on substrate 100 in fin region 50, and a planar device isolation layer 116 completely covering sidewalls of planar active region 106 b is formed on substrate 100 in planar region 55. An upper surface of planar device isolation layer 116 is roughly the same height as an upper surface of planar active region 106 b, and a lower surface of planar device isolation layer 116 is lower than a lower surface of fin device isolation layer 115 a.

Preferably, fin and planar device isolation layers 115 a and 116 are formed of a material having an excellent gap-fill characteristic. For instance, fin and planar device isolation layers 115 a and 116 may be formed of a high-density plasma silicon oxide layer, or a silicon on glass (SOG) layer. Preferably, the fin and planar device isolation layers 115 a and 116 are formed of the same material.

As described above, the upper surface of planar active region 106 b is lower than that of fin active region 106 a. Moreover, it is preferable that the upper surface of planar active region 106 b has a height similar to the upper surface of fin device isolation layer 115 a.

A fin gate electrode 130 a is formed across fin active region 106 a, and a planar gate electrode 130 b is formed across planar active region 106 b. Fin gate electrode 130 a is formed in contact with the upper surface and both sidewalls of fin active region 106 a. In contrast, since planar device isolation layer 116 completely covers sidewalls of planar active region 106 b, planar gate electrode 130 b is in contact with the upper surface of planar gate electrode 130 b, but not the sidewalls.

Preferably, a first gate insulating layer 122 a is interposed between fin gate electrode 130 a and upper sidewalls of fin active region 106 a, and a fin hard mask pattern 104 a is interposed between fin gate electrode 130 a and an upper surface of fin active region 106 a. In addition, a second gate insulating layer 122 b is interposed between planar gate electrode 130 b and planar active region 106 b. Preferably, fin hard mask pattern 104 a is thicker than first gate insulating layer 122 a so that a channel region is not formed on the upper surface of fin active region 106 a. This prevents an electric field from being concentrated at an upper edge of fin active region 106 a. As a result, a hump phenomenon caused by concentration of the electric field on the upper edge of the fin active region is avoided.

Preferably, fin gate electrode 130 a includes a sidewall gate 124 a and a top gate 128 a. Sidewall gate 124 a is formed on the upper sidewalls of fin active region 106. First gate insulating layer 122 a is interposed between sidewall gate 124 a and the upper sidewalls of fin region 106 a and top gate 128 a is formed on the upper surface of fin active region 106 a over fin hard mask pattern 104 a. In general, an upper surface of sidewall gate 124 a has the same height as an upper surface of fin hard mask pattern 104 a and top gate 128 a is electrically connected to sidewall gate 124 a.

Preferably, planar gate electrode 130 b includes a lower gate 126 a and an upper gate 128 b, which are stacked sequentially. An upper surface of lower gate 126 a has the same height as sidewall gate 124 a in fin region 50 and upper gate 128 b generally has the same thickness as top gate 128 a. Accordingly, upper surfaces of upper gate 128 b and top gate 128 a typically have the same height. In other words, upper surfaces of fin gate electrode 130 a and planar gate electrode 130 b generally have the same height.

In FIG. 4, respective lower surfaces of sidewall gate 124 a and lower gate 126 a are formed with the same height by controlling the height of the upper surface of fin device isolation layer 115 a. In addition, the upper surfaces of fin gate electrode 130 a and planar gate electrode 130 b have the same height. Accordingly, fin gate electrode 130 a and planar gate electrode 130 b each have the same overall thickness.

First gate insulating layer 122 a is typically formed of a silicon oxide layer (e.g., a thermal oxide layer), a silicon nitride layer and/or a silicon oxynitride layer. In addition, first gate insulating layer 122 a may be formed of a high-k dielectric layer with a relatively high dielectric constant compared to the silicon nitride layer. For instance, the first gate insulating layer 122 a is preferably formed of hafnium oxide (HfO₂), hafnium silicate (HfSiO), hafnium silicate nitride (HfSiON), hafnium tantalum oxide (Ta₂O₅), zirconium oxide (ZrO₂), aluminum oxide (Al₂O₃), hafnium aluminum oxide (HfAlO), lanthanum oxide (La₂O₃), or a combination thereof.

Fin hard mask pattern 104 a typically includes a silicon oxide layer and a silicon nitride layer, which are stacked sequentially. Second gate insulating layer 122 b is generally formed of a silicon oxide layer (particularly, a thermal oxide layer), a silicon nitride layer and/or a silicon oxynitride layer. Second gate insulating layer 122 b is typically formed of a high-k dielectric layer having a relatively high dielectric constant compared to the silicon nitride layer. For example, second gate insulating layer 122 b is preferably formed of hafnium oxide (HfO₂), hafnium silicate (HfSiO), hafnium silicate nitride HfSiON, hafnium tantalum oxide (Ta₂O₅), zirconium oxide (ZrO₂), aluminum oxide (Al₂O₃), hafnium aluminum oxide (HfAlO), lanthanum oxide (La₂O₃), or a combination thereof. First and second gate insulating layers 122 a and 122 b typically have the same thickness as each other, although this does not necessarily have to be the case.

Sidewall gate 124 a and top gate 128 a of fin gate electrode 130 a are formed of a conductive layer. For example, sidewall gate 124 a and top gate 128 a may be formed of a doped polysilicon layer and/or a low resistance conductor. In this case, lower gate 126 a of planar gate electrode 130 b is preferably formed of the same material as sidewall gate 124 a. Top gate 128 a of fin gate electrode 130 a and upper gate 128 b of planar gate electrode 130 b are typically formed of the same material. Top gate 128 a and upper gate 128 b may include doped polysilicon and a low resistance conductor, which are sequentially stacked. The low resistance conductor generally comprises at least one element selected from a group consisting of conductive a metal nitride (e.g., titanium nitride, tantalum nitride), a metal (e.g., tungsten, molybdenum), and a metal silicide (e.g., cobalt silicide, nickel silicide, titanium silicide, tungsten silicide).

A first impurity doped layer 132 a is formed in fin active region 106 a on both sides of fin gate electrode 130 a. First impurity doped layer 132 a corresponds to source/drain regions of a fin transistor. A second impurity doped layer 132 b is formed in planar active region 106 b on both sides of planar gate electrode 130 b. Second impurity doped layer 132 b corresponds to source/drain regions of a planar transistor.

In the semiconductor device of FIG. 4, the upper surface of planar active region 106 b is relatively lower than that of the fin active region 106 a. However, the difference between the thicknesses of fin gate electrode 130 a and planar gate electrode 130 b is dramatically less than the difference between fin gate electrode 11 a and planar gate electrode 11 b in FIG. 3. Accordingly, etching damage is prevented from occurring in planar active region 106 b and second gate insulating layer 122 b during etching processes used to form respective fin and planar gate electrodes 130 a and 130 b.

FIGS. 6 through 14 are perspective views illustrating a method of forming a semiconductor device having a fin transistor and a planar transistor according to an embodiment of the present invention.

Referring to FIG. 6, a first etch mask pattern 102 is formed on substrate 100 in fin region 50, leaving substrate 100 exposed in planar region 55. First etch mask pattern 102 is formed of a material having an etch selectivity relative to substrate 100. For example, first etch mask pattern 102 is generally formed of a photo sensitive layer, a silicon oxide layer, a silicon nitride layer, a silicon oxynitride layer, or a combination thereof.

Substrate 100 is etched to recess substrate 100 in planar region 55 using first etch mask pattern 102 as an etch mask. In FIG. 6, a dotted line in planar region 55 indicates the etched portion of substrate 100.

Referring to FIG. 7, first etch mask pattern 102 is removed to expose substrate 100 in fin region 50. Then, a hard mask layer is formed over the entire surface of substrate 100, and the hard mask layer is patterned to form a fin hard mask pattern 104 a and a planar hard mask pattern 104 b. Fin hard mask pattern 104 a is formed on substrate 100 in fin region 50, and planar mask pattern 104 b is formed on substrate 100 in planar region 50. Planar hard mask pattern 104 b is relatively wider than fin hard mask pattern 104 a. Fin and planar hard mask patterns 104 a and 104 b are generally formed at the same time. However, where there is a difficulty performing a photolithography process due to the difference of the height of substrate 100 between regions 50 and 55, fin and planar hard mask patterns 104 a and 104 b may be formed sequentially.

Preferably, hard mask patterns 104 a and 104 b are formed of at least one insulating layer having an etch selectivity relative to substrate 100. For example, hard mask patterns 104 a and 104 b typically include a silicon nitride layer and a silicon oxynitride layer. Hard mask patterns 104 a and 104 b may further include a buffer oxide layer interposed between the silicon nitride layer (or silicon oxynitride layer) and substrate 100. The buffer oxide layer typically performs a function of buffering stress between the silicon nitride layer (or silicon oxynitride layer) and substrate 100.

Referring to FIG. 8, substrate 100 is etched using hard mask patterns 104 a and 104 b as an etch mask to form fin active region 106 a and planar active region 106 b. First trenches surround fin active region 106 a in fin region 50 and second trenches surround planar active region 106 b in planar region 55, and a bottom surface of the second trenches is lower than a bottom surface of the first trenches.

Fin active region 106 a protrudes upwards from substrate 100 in fin region 50 and planar active region 106 b protrudes upwards from substrate 100 in planar region 55. The upper surface planar active region 106 b is lower than that of fin active region 106 a.

Referring to FIG. 9, a device isolation insulating layer 112 filling the first and second trenches and completely covering hard mask patterns 104 a and 104 b is formed over the entire surface of substrate 100. An upper surface of device isolation insulating layer 112 is planarized so that upper surface of device isolation insulating layer 112 has the same height in fin region 50 and planar region 55.

The following steps provide one way of forming device isolation insulating layer 112. A first insulating layer 108 filling the first and second trenches is formed over an entire surface of substrate 100. Then, first insulating layer 108 is planarized until the upper surface of fin hard mask pattern 104 a is exposed. Then, a second insulating layer 110 is formed on planarized first insulating layer 108. First and second insulating layers 108 and 110 typically comprise silicon nitride layers.

A second etch mask pattern 114 is formed on device isolation insulating layer 112 in fin region 50, leaving device isolation insulating layer 112 exposed in planar region 55. Second etch mask pattern 114 is formed of a material having an etch selectivity relative to device isolation insulating layer 112. For instance, second etch mask pattern 114 is generally formed of a photo sensitive layer, a silicon nitride layer, a silicon oxynitride layer, or a polysilicon layer.

Referring to FIG. 10, by using second etch mask pattern 114 as a mask, device isolation insulating layer 112 in planar region 55 is planarized using an etch-back process until planar hard mask pattern 104 b is exposed. As a result, a planar device isolation layer 116 filling the second trench is formed. Planar device isolation layer 116 covers sidewalls of planar active region 106 b.

Exposed planar hard mask pattern 104 b is typically removed after second etch mask pattern 114 is removed. Alternatively, however, exposed planar hard mask pattern 104 b can be removed before second etch mask pattern 114 is removed.

In the event that the upper surface of planar device isolation layer 116 protrudes over the upper surface of planar active region 106 b, an additional process for removing part of planar device isolation layer 116 may be performed. After performing the additional process, the upper surface of planar device isolation layer 116 has roughly the same height as the upper surface of planar active region 106 b and planar active region 116 completely covers sidewalls all of planar active region 106 b.

An etch stop layer 118 is formed over the entire surface of substrate 100. Etch stop layer 118 is higher in fin region 50 than in planar region 55 because of the height of device isolation insulating layer 112 in fin region 50. Etch stop layer 118 is typically formed of a material having an etch selectivity relative to device isolation insulating layer 112 in fin region 50. For instance, etch stop layer 118 is typically formed of a double layer comprising a silicon oxide layer and a silicon nitride layer, or a silicon oxide layer and a silicon oxynitride layer.

A buffer layer 120 is formed on etch stop layer 118 such that an upper surface of buffer layer 120 in fin region 50 is higher than an upper surface of buffer layer 120 in planar region 55. Buffer layer 120 is preferably formed of a silicon oxide layer.

Referring to FIG. 11, buffer layer 120, etch stop layer 118, and device isolation insulating layer 112 in fin region 50 are removed by a Chemical Mechanical Polishing (CMP) process until fin hard mask pattern 104 a is exposed. As a result, a preliminary fin device isolation layer 115 filling the first trench is formed in fin region 50 while buffer layer 120 remains in planar region 55. In this case, an upper surface of preliminary fin device isolation layer 115 generally has the same height as an upper surface of buffer layer 120 in planar region 55.

Buffer layer 120, etch stop layer 118, and device isolation insulating layer 112 may be planarized together by a single CMP process. Alternatively, buffer layer 120 may be planarized using the following steps. A first CMP is performed until etch stop layer 118 of fin region 50 is exposed. Exposed etch stop layer 118 is then removed using a wet etch process. A second CMP is performed with respect to device isolation insulating layer 112 in fin region 50. While the first and second CMP processes are performed, buffer layer 120 in planar region 55 is also planarized.

Referring to FIG. 12, a fin device isolation layer 115 a is formed by etching preliminary fin device isolation layer 115 and buffer layer 120 in planar region 55 until etch stop layer 118 in planar region 55 is exposed. Accordingly, the upper surface of fin device isolation layer 115 a has a height similar to that of the upper surface of planar active region 106 b. Fin device isolation layer 115 a covers lower sidewalls of fin active region 106 a, leaving upper sidewalls of fin active region 106 a exposed. After etch stop layer 118 is exposed, a time-etch process for controlling the height of the upper surface of fin device isolation layer 115 a may be further performed. It is possible to control the height of the upper surface of fin device isolation layer 115 a by controlling the time-etch process so that the upper surface of fin device isolation layer 115 a is the same as the height of the upper surface of planar active region 106 b. Exposed etch stop layer 118 in planar region 55 is removed to expose planar active region 106 b.

Referring to FIG. 13, first gate insulating layer 122 a is formed on the exposed surface of fin active region 106 a. Second gate insulating layer 122 b is formed on the exposed surface of planar active region 106 b. First and second gate insulating layers 122 a and 122 b are typically formed of a silicon oxide layer (e.g., a thermal oxide layer), a silicon nitride layer, and/or a silicon oxynitride layer. First and second gate insulating layers 122 a and 122 b preferably have the same thickness, however, they may also be formed to have different thicknesses (e.g., by performing a selective thermal oxidation process using an oxidation barrier layer). Moreover, first and second gate insulating layers 122 a and 122 b may be formed of a high-k dielectric layer having a relatively high dielectric constant compared with the silicon nitride layer. For example, first and second gate insulating layers 122 a and 122 b may be formed of hafnium oxide (HfO₂), hafnium silicate (HfSiO), hafnium silicate nitride (HfSiON), hafnium tantalum oxide (Ta₂O₅), zirconium oxide (ZrO₂), aluminum oxide (Al₂O₃), hafnium aluminum oxide (HfAlO), lanthanum oxide (La₂O₃), or a combination thereof.

A first gate conductive layer is then formed over the entire surface of substrate 100. The first gate conductive layer is planarized by CMP until fin hard mask pattern 104 a is exposed, thus forming a sidewall gate conductive layer 124 filling the first trenches on fin device isolation layer 115 a in fin region 50, and a lower gate conductive layer 126 in planar region 55.

An upper surface of sidewall gate conductive layer 124 in fin region 50 has the same height as an upper surface of lower gate conductive layer 126 in planar region 55. Sidewall gate conductive layer 124 and lower gate conductive layer 126 are generally formed of a doped polysilicon layer and/or a low resistance conductor. The low resistance conductor generally includes at least one element selected from a group consisting of a conductive metal nitride (e.g., titanium nitride and tantalum nitride), a metal (e.g., tungsten and molybdenum), and a metal silicide (e.g., cobalt silicide, nickel silicide, titanium silicide, and tungsten silicide).

Referring to FIG. 14, a second gate conductive layer 128 is formed over the entire surface of substrate 100. Second gate conductive layer 128 typically includes doped polysilicon and a low resistance conductor, which are stacked sequentially. The low resistance conductor typically includes at least one element selected from a group consisting of conductive a metal nitride (e.g., titanium nitride and tantalum nitride), a metal (e.g., tungsten and molybdenum), and a metal silicide (e.g., cobalt silicide, nickel silicide, titanium silicide, and tungsten silicide).

The sum of the thicknesses of the sidewall gate conductive layer 124 and second gate conductive layer 128 on fin device isolation layer 115 a may be defined as a first thickness “T1”, and the sum of the thicknesses of lower gate conductive layer 126 and second gate conductive layer 128 over planar active region 106 b may be defined as a second thickness “T2”.

Second gate conductive layer 128, sidewall gate conductive layer 124, and lower gate conductive layer 126 are patterned to form fin gate electrode 130 a and planar gate electrode 130 b, which are shown in FIG. 4. Fin gate electrode 130 a includes a sidewall gate 124 a formed from sidewall gate conductive layer 124 and a top gate 128 a formed from second gate conductive layer 128. Planar gate electrode 130 b includes a lower gate 126 a formed from lower gate conductive layer 126 and an upper gate 128 b formed from second gate conductive layer 128.

Impurity ions are implanted into fin active region 106 a and planar active region 106 b using fin gate electrode 130 a and planar gate electrode 130 b as masks to form respective first and second impurity doped layers 132 a and 132 b shown in FIG. 4. First and second impurity doped layers 132 a and 132 b may be formed either sequentially or simultaneously.

In the above-described method of forming a semiconductor device, the upper surface of planar active region 106 b is formed to be lower than fin active region 106 a by selectively recessing substrate 100 in planar region 55. Accordingly, the difference between the thicknesses of gate electrodes formed in fin region 50 and fin region 55 are small compared with the difference between corresponding thicknesses in a conventional device such as that shown in FIG. 3. As a result, etching damage is prevented from occurring in planar active region 55 and/or gate insulating layer 122 b during the formation of planar gate electrode 130 b.

More particularly, the upper surface of second gate conductive layer 128 in the fin region 50 has the same height as second gate conductive layer 128 in planar region 55 owing to sidewall gate conductive layer 124 and lower gate conductive layer 126. As a result, the difference between first thickness “T1” and second thickness “T2” is minimized. Furthermore, first thickness “T1” and second thickness “T2” may be formed to be equal by controlling the height of the upper surface of fin device isolation layer 115 a. Therefore, it is possible to prevent etching damage in a planar active region and/or a gate oxide layer due to the similarity between first thickness “T1” and second thickness “T2”.

As previously mentioned, a planar active region is formed to be lower than the fin active region to minimize a thickness difference between a fin gate electrode and a planar gate electrode. Minimizing the thickness difference between the fin gate electrode and the planar gate electrode prevents damage from occurring in the manufacture of the semiconductor device to preserve the device's electrical characteristics. 

1. A method of forming a semiconductor device, the method comprising: forming a fin active region on a semiconductor substrate defining a fin region and a planar region, the fin active region protruding upward from the semiconductor substrate in the fin region, wherein forming the fin active region and the planar active region comprises: recessing the semiconductor substrate in the planar region; forming a fin hard mask pattern on the semiconductor substrate in the fin region and a planar hard mask pattern on the semiconductor substrate in the planar region; and anisotropically etching the semiconductor substrate using the fin and planar hard mask patterns as an etch mask; forming a planar active region on the semiconductor substrate, the planar active region protruding upward from the semiconductor substrate in the planar region and having an upper surface which is lower than an upper surface of the fin active region; forming a fin device isolation layer covering lower sidewalls of the fin active region; forming a planar device isolation layer completely covering sidewalls of the planar active region; forming a fin gate electrode across the fin active region; and forming a planar gate electrode across the planar active region.
 2. The method of claim 1, wherein forming the fin and planar device isolation layers comprises: forming a device isolation insulating layer filling etched portions of the fin region and the planar region over an entire surface of the semiconductor substrate; selectively planarizing the device isolation insulating layer in the planar region until the planar hard mask pattern is exposed to form the planar device isolation layer; removing the planar hard mask pattern; forming an etch stop layer over the entire surface of the semiconductor substrate; forming a buffer layer on the etch stop layer; forming a preliminary fin device isolation layer by planarizing the buffer layer, the etch stop layer, and the device isolation insulating layer, all in the fin region, until the fin hard mask pattern is exposed; etching the preliminary fin device isolation layer and the buffer layer in the planar region until the etch stop layer of the planar region is exposed to form the fin device isolation layer; and removing the etch stop layer in the planar region to expose the planar active region.
 3. The method of claim 2, wherein forming the device isolation insulating layer comprises: forming a first insulating layer over the entire surface of the semiconductor substrate; planarizing the first insulating layer until the fin hard mask pattern is exposed; and, forming a second insulating layer over the entire surface of the semiconductor substrate.
 4. The method of claim 3, wherein the fin gate electrode comprises a sidewall gate and a top gate, and, wherein the sidewall gate is formed between the fin active next to the first gate insulating layer, and the top gate is formed above the fin active region on top of the fin hard mask pattern; and, wherein the planar gate electrode comprises lower and upper gates, which are stacked sequentially.
 5. The method of claim 2, wherein forming the fin gate electrode and the planar gate electrode comprises: forming a first gate insulating layer on upper sidewalls of the fin active region; forming a second gate insulating layer on the planar active region; forming a first gate conductive layer over the entire surface of the semiconductor substrate; planarizing the first gate conductive layer until the fin hard mask pattern is exposed; forming a second gate conductive layer over the entire surface of the semiconductor substrate; and successively patterning the second gate conductive layer and the planarized second gate conductive layer to form the fin gate electrode and the planar gate electrode.
 6. The method of claim 5, wherein the first and second gate insulating layers are formed of a high-k dielectric layer having a higher dielectric constant than a silicon nitride layer.
 7. The method of claim 1, further comprising: forming a first impurity doped layer in the fin active region on opposite sides of the fin gate electrode; and, forming a second impurity doped layer in the planar active region on opposite sides of the planar gate electrode.
 8. The method of claim 3, wherein at least one of the first gate insulating layer and the second gate insulating layer is formed of hafnium oxide (HfO₂), hafnium silicate (HfSiO), hafnium silicate nitride (HfSiON), hafnium tantalum oxide (Ta₂O₅), zirconium oxide (ZrO₂) aluminum oxide (Al₂O₃) hafnium aluminum oxide (HfAlO), lanthanum oxide (La₂O₃), or a combination thereof.
 9. The semiconductor device of claim 3, wherein the top gate comprises a low resistance conductor comprising at least one element selected from a group consisting of titanium nitride, tantalum nitride, tungsten, molybdenum, cobalt silicide, nickel silicide, titanium silicide, and tungsten silicide. 